Maskless fabrication of three-dimensional microstructures with high isotropic resolution: practical and theoretical considerations
Maskless fabrication of three-dimensional microstructures with high isotropic resolution: practical and theoretical considerations
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DOI：
10.1364/ao.50.002383
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发表时间：
2011-06-01
期刊：
影响因子：
1.9
通讯作者：
Hur, Jun-Gyu
中科院分区：
文献类型：
--
作者：
Hur, Jun-Gyu
提出了一种基于数字微镜器件（DMD）的无掩模三维（3D）微细加工方法。在DMD的虚拟掩模下横向扫描衬底。掩模被分配给大量的虚拟切片，所有这些都在载物台的单次扫描中投影。在光刻胶中的累积剂量分布的理论模型推导和用于预测所得的3D轮廓。实验结果表明，该方法可以有效地避免阶梯问题，防止错位误差。(C)2011年美国光学学会
A maskless three-dimensional (3D) microfabrication method based on a digital micromirror device (DMD) is proposed for high lateral and vertical resolution. A substrate is scanned laterally under virtual masks of the DMD. The masks are allocated to a large number of virtual slices, all of which are projected in a single scan of the stage. A theoretical model for the cumulative dose distribution in a photoresist is derived and used to predict the resulting 3D profile. Experiments showed that the proposed method is promising for avoiding the stair-step problem and preventing misalignment errors. (C) 2011 Optical Society of America