Dye stability under excimer-laser pumping
Dye stability under excimer-laser pumping
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准分子激光泵浦下的染料稳定性
DOI：
10.1007/bf00688768
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发表时间：
1983
期刊：
影响因子：
--
通讯作者：
K. Hohla
中科院分区：
文献类型：
--
作者：
V. Antonov;K. Hohla
研究了XeCl激光（308 nm）激发下激光染料的稳定性。测量在振荡放大器装置中进行，其中放大器完全饱和。这允许与理论模型进行比较，表明染料降解的主要原因是光产物的吸收。最重要的染料的结果。在染料溶液降解至其初始能量输出的1/2之前，染料稳定性范围为每分子46（荧光素27）至3.4×104（QUI）吸收过程。
The stability of laser dyes under the excitation of a XeCl-laser (308 nm) has been investigated. The measurements were performed in an oscillator amplifier device where the amplifier was fully satured. This allows the comparison with the theoretical model showing that the main reason for dye degradation is the absorption of photo-products. Results for the most important dyes are presented. Dye stabilities range from 46 (fluorescein 27) to 3.4×104(QUI) absorption processes per molecule before the dye solution has degraded to 1/2 of its initial energy output.