Photosensitive Hypervalent Fluorinated Sulfur Containing Polymers for Light Sensitive Applications
Photosensitive Hypervalent Fluorinated Sulfur Containing Polymers for Light Sensitive Applications
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用于光敏感应用的光敏高价氟化含硫聚合物
DOI：
10.1002/pol.20190104
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发表时间：
2020
影响因子：
3.4
通讯作者：
Welch, John T.
中科院分区：
文献类型：
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作者：
Bonetti, Kelly A.;Murphy, Michael;Brainard, Robert L.;Zhong, Linbin;Welch, John T.
在本研究中，两种类型的超支化（HB）聚硫醚可以很容易地在短时间内在室温下通过硫醇迈克尔加成反应。使用有机碱1，5，7-三氮杂双环[4.4. 0]癸-5-烯（TBD）作为催化剂在CHCl 3中在室温下反应，以提供随后的HB聚硫醚。对于监测分子量随时间演变的DMDAC情况，研究了TBD浓度对聚合的影响。HB聚硫醚的特征在于使用光谱（NMR）和色谱（GPC与RI和LS检测器）技术。
In this study, two types of hyperbranched (HB) polythioether could readily be achieved in a short time at ambient temperature through a thiol-Michael addition reaction. Dimethyl acetylenedicarboxylate (DMADC) or methyl propiolate (A2) and trimethylolpropane tris (3-mercaptopropionate)(B3) monomers were reacted using an organobase 1, 5, 7-triazabicyclo [4.4. 0] dec-5-ene (TBD) as a catalyst in CHCl3 at room temperature to provide subsequent HB polythioethers. The effect of TBD concentration on the polymerization was studied for the DMDAC case monitoring the molecular weight evolution against time. HB polythioethers were characterized using spectroscopic (NMR) and chromatographic (GPC with RI and LS detectors) techniques.