Rutile-type TiO2 formation by ion beam dynamic mixing
Rutile-type TiO2 formation by ion beam dynamic mixing
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离子束动态混合形成金红石型 TiO2
DOI：
10.1116/1.577851
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发表时间：
1992
期刊：
影响因子：
--
通讯作者：
A. Chayahara
中科院分区：
文献类型：
--
作者：
S. Miyake;K. Honda;T. Kohno;Y. Setsuhara;M. Satou;A. Chayahara
一个紧凑的动态混合系统与桶型电子回旋共振（ECR）离子源用于氧化膜的形成。氧离子能量可以在1和25 keV之间变化，具有用于氧化物膜形成的足够的电流密度。采用Ti蒸发和O2+/O+离子束轰击法在Si片和石英片上制备了TiO 2薄膜。在约3×10−3 Pa下制备的薄膜的X射线衍射（XRD）显示了单独的TiO 2的多晶金红石结构，并且结晶受到离子能量及其到达速率的影响。这些薄膜的卢瑟福背散射光谱表明，薄膜组合物具有化学计量的TiO 2与或不与离子轰击。样品上的背景冷O2流对成分有很大影响，在约3×10−4 Pa下，通过离子轰击，薄膜显示出TiO结构。
A compact dynamic mixing system with a bucket type electron cyclotron resonance (ECR) ion source is used for the formation of oxide films. The oxygen ion energy can be varied between 1 and 25 keV with sufficient current density for the oxide film formation. Titanium oxide films were prepared by Ti evaporation and O2+/O+ ion beam bombardment onto Si wafers and quartz plates. X‐ray diffraction (XRD) of films prepared at about 3×10−3 Pa presents polycrystal rutile structure of TiO2 alone and the crystallization is influenced by ion energy and its arrival rate. Rutherford backscattering spectroscopy of these films indicates that the film composition has stoichiometry of TiO2 with or without ion bombardment. The composition is greatly affected by the background cold O2 flow onto samples and at about 3×10−4 Pa the film shows the structure of TiO by ion bombardment.