Excimer laser processing of ZnO thin films prepared by the sol-gel process
Excimer laser processing of ZnO thin films prepared by the sol-gel process
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DOI：
10.1016/j.apsusc.2007.08.072
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发表时间：
2007-12-15
影响因子：
6.7
通讯作者：
Crean, Gabriel M.
中科院分区：
文献类型：
--
作者：
Winfield, R. J.;Koh, L. H. K.;Crean, Gabriel M.
以无水醋酸锌[Zn（C2 H3 O2）（2）]、单乙醇胺[H2 NC 2 H4 OH]和异丙醇为原料，采用溶胶-凝胶法在钠钙玻璃上制备了ZnO薄膜。将沉积的膜在50和300 ℃下干燥。X射线衍射分析表明薄膜为非晶态。使用受激准分子激光器进行激光退火。激光脉冲重复频率为25 Hz，脉冲能量为5.9 mJ，在ZnO薄膜上的能量密度为225 mJ cm（-2）。通常，每单位面积的膜使用五个激光脉冲。激光处理后，从X射线衍射图分析观察到六方纤锌矿相的氧化锌。薄膜在可见光区的透明度大于70%。光学带隙能量为3.454 eV。扫描电子显微镜和轮廓仪分析突出了激光加工导致的形态变化。这种比较研究表明，我们的溶胶-凝胶工艺路线显着不同于ZnO溶胶-凝胶薄膜制备的常规炉退火，需要高于450摄氏度的温度形成的晶体ZnO。(c)2007 Elsevier B. V.保留所有权利。
ZnO thin films were prepared on soda-lime glass from a single spin-coating deposition of a sol-gel prepared with anhydrous zinc acetate [Zn(C2H3O2)(2)], monoethanolamine [H2NC2H4OH] and isopropanol. The deposited films were dried at 50 and 300 degrees C. X-ray analysis showed that the films were amorphous. Laser annealing was performed using an excimer laser. The laser pulse repetition rate was 25 Hz with a pulse energy of 5.9 mJ, giving a fluence of 225 mJ cm(-2) on the ZnO film. Typically, five laser pulses per unit area of the film were used. After laser processing, the hexagonal wurtzite phase of zinc oxide was observed from X-ray diffraction pattern analysis. The thin films had a transparency of greater than 70% in the visible region. The optical band-gap energy was 3.454 eV. Scanning electron microscopy and profilometry analysis highlighted the change in morphology that occurred as a result of laser processing. This comparative study shows that our sol-gel processing route differs significantly from ZnO sol-gel films prepared by conventional furnace annealing which requires temperatures above 450 degrees C for the formation of crystalline ZnO. (c) 2007 Elsevier B.V. All rights reserved.