Ablation and surface modifications of PMMA using a laser-plasma EUV source
Ablation and surface modifications of PMMA using a laser-plasma EUV source
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DOI：
10.1007/s00340-009-3692-8
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发表时间：
2009-09-01
影响因子：
2.1
通讯作者：
Szczurek, M.
中科院分区：
文献类型：
--
作者：
Bartnik, A.;Fiedorowicz, H.;Szczurek, M.
聚合物的表面改性和微结构化主要使用来自准分子灯或准分子激光器的紫外（UV）辐射来进行。然而，在这种情况下，辐射穿透深度可能超过100 μ m，从而使内部深处的聚合物降解。另一方面，极紫外（EUV）辐射仅在约100 nm厚的层中被吸收。在这项工作中，从一个基于双流喷气靶的激光等离子体EUV源的辐射聚焦与金涂层的椭球收集器的聚甲基丙烯酸甲酯（PMMA）的表面改性。聚焦辐射的光谱由最大值为10 nm的窄特征和高达70 nm的长波尾部组成。将PMMA样品安装在EUV收集器的焦平面中或在该平面下游的某个距离处，并以10-Hz的重复率照射10-60 s。使用扫描电子显微镜研究了辐照的聚合物样品。当能量密度超过10 mJ/cm（2）时，PMMA的烧蚀过程较为平稳。对于较低的能量密度，但接近这个值，强烈的表面改性出现。
Surface modification and micro-structuring of polymers for different application is mainly performed using ultraviolet (UV) radiation from excimer lamps or excimer lasers. In this case, however, the radiation penetration depth may exceed 100 mu m, thereby degrading the polymer deep inside. On the other hand, extreme ultraviolet (EUV) radiation is absorbed in a layer approximately 100 nm thick only. In this work, the radiation from a laser-plasma EUV source based on a double-stream gas-puff target is focused with a gold-coated ellipsoidal collector for surface modification of polymethylmethacrylate (PMMA). The spectrum of the focused radiation consists of a narrow feature with maximum at 10 nm and a long-wavelength tail up to 70 nm. The PMMA samples are mounted in the focal plane of the EUV collector or at some distance downstream this plane and irradiated for 10-60 s with 10-Hz repetition rate. The irradiated polymer samples were investigated using a scanning electron microscope. When the EUV fluence exceeds 10 mJ/cm(2), smooth ablation of PMMA was obtained. For lower fluences but close to this value, strong surface modifications appeared.