Electrodeposition of Sb, Bi, Te, and their alloys in AlCl3-NaCl-KCl molten salt
Electrodeposition of Sb, Bi, Te, and their alloys in AlCl3-NaCl-KCl molten salt
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DOI：
10.1016/j.electacta.2007.03.017
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发表时间：
2007-11-20
影响因子：
6.6
通讯作者：
Ohtsuka, Toshiaki
中科院分区：
文献类型：
--
作者：
Ebe, Hirofumi;Ueda, Mikito;Ohtsuka, Toshiaki
采用伏安法研究了 Sb、Bi 和 Te 在含有 SbCl3、BiCl3 和/或 TeCl4 的 AlCl3-NaCl-KCl 熔盐中在 423 K 下的电化学行为，并在熔体中恒电位控制下进行了三种金属的电沉积。在含有0.025 mol dm(-3) [M] SbCl3的熔体中，在玻碳(GC)电极上的伏安图显示出一对对应于Sb/Sb(III)氧化还原反应的氧化还原峰，并且在恒电位控制下沉积了稳定的纯Sb层。含有 0.025 M BiCl3 或 0.025 M TeCl4 的熔体的伏安图显示出几个氧化还原对。在恒定电势控制下，没有获得稳定的纯Bi和Te沉积层，因为沉积层从电极上脱离并立即溶解到熔盐中。二元合金沉积可以在含有 BiCl3 和 SbCl3 的熔体中进行，也可以在含有 BiCl3 和 TeCl4 的熔体中进行。在含有 BiCl3 和 SbCl3 的熔体中，相对于 Al/Al(III)，在 0.8 和 0.9 V 电压下获得了金属 Sb 和 Bi-Sb 固溶体的稳定 Bi-Sb 合金沉积。沉积物中Bi的原子比在0.9V时为37%，在0.8V时为57%。用含有BiCl3和TeCl4的熔盐也获得了稳定的Bi-Te合金沉积物。沉积的 Bi-Te 合金由 Bi2Te3、BiTe 和 Bi2Te 的混合物组成。合金沉积物结晶度良好，择优取向为(I 10 )面。 (C) 2007 Elsevier Ltd. 保留所有权利。
The Electrochemistry of Sb, Bi, and Te in AlCl3-NaCl-KCl molten salt containing SbCl3, BiCl3, and/or TeCl4 at 423 K was investigated by voltammetry, and electrodeposition of the three metals was performed under constant potential control in the melt. The voltammogram on a glassy carbon (GC) electrode in a melt containing 0.025 mol dm(-3) [M] SbCl3 showed a couple of redox peak corresponding to the Sb/Sb(III) redox reaction, and a stable layer of pure Sb was deposited under the constant potential control. The voltammograms in the melt containing 0.025 M BiCl3 or 0.025 M TeCl4 showed several redox couples. Stable deposit layers of pure Bi and Te were not obtained under the constant potential control, as the deposited layers detached from the electrode and immediately dissolved into the molten salt. Binary alloy deposition was possible in a melt containing BiCl3 and SbCl3, and also with BiCl3 and TeCl4. A stable Bi-Sb alloy deposit of metallic Sb and Bi-Sb solid solution was obtained at 0.8 and 0.9 V versus Al/Al(III) in the melt containing BiCl3 and SbCl3. The atomic ratio of Bi in the deposit was 37% at 0.9 V and 57% at 0.8 V. A stable Bi-Te alloy deposit was also obtained with the molten salt containing BiCl3 and TeCl4. The deposited Bi-Te alloy consisted of a mixture of Bi2Te3, BiTe, and Bi2Te. The alloy deposit had good crystallinity and the preferential orientation was the (I 10) plane. (C) 2007 Elsevier Ltd. All rights reserved.