Influence of substrate roughness on the magnetic properties of thin fcc Co films
Influence of substrate roughness on the magnetic properties of thin fcc Co films
复制标题
DOI：
10.1063/1.2711611
复制
发表时间：
2007-05
影响因子：
3.2
通讯作者：
S. J. Steinmuller;C. Vaz;V. Ström;C. Moutafis;C. M. Gürtler;M. Kläui;J. Bland;Z. Cui
中科院分区：
文献类型：
--
作者：
S. J. Steinmuller;C. Vaz;V. Ström;C. Moutafis;C. M. Gürtler;M. Kläui;J. Bland;Z. Cui
本文研究了衬底粗糙度对Cu（001）scinSi（001）衬底上生长的面心立方Co薄膜（7和17nm厚）磁性能的影响。随着薄膜粗糙度的增加，立方各向异性显着降低，观察到布里渊光散射。此外，较粗糙的样品表现出自旋波峰的显著加宽。这两种效果被发现是更明显的薄的Co层。我们提出了一个磁性配置与磁化以下相干的基板形态（“起伏”状态），导致在没有磁性表面电荷。这种配置引起的外延薄膜的磁各向异性的减少，在良好的定性与实验观察。
We present a study of the influence of substrate roughness on the magnetic properties of thin fcc Co films (7 and 17nm thick) grown on Cu(001)∕Si(001). A significant decrease in cubic anisotropy with increasing film roughness was observed with Brillouin light scattering. In addition, the rougher samples exhibited a substantial broadening of the spin wave peaks. Both effects were found to be more pronounced for the thinner Co layers. We propose a magnetic configuration with the magnetization following coherently the substrate morphology (“undulating” state) resulting in the absence of magnetic surface charges. This configuration gives rise to a reduction in the magnetic anisotropy of epitaxial thin films, in good qualitative agreement with the experimental observations.