Molecular beam epitaxy of p‐type ZnSTe:N and p–n‐junction light emitting diodes
Molecular beam epitaxy of p‐type ZnSTe:N and p–n‐junction light emitting diodes
复制标题
p 型 ZnSTe:N 和 p-n 结发光二极管的分子束外延
DOI:
10.1002/pssc.201300626
复制
发表时间:
2014
期刊:
影响因子:
--
通讯作者:
S. Kashiyama
中科院分区:
文献类型:
--
作者:
K. Ichino;T. Kojima;S. Obata;Takuma Kuroyanagi;Kenta Kimata;Shoichi Nakazawa;S. Kashiyama
p-type doping of ZnS1–xTex alloy with N acceptors has been studied with an idea that an upward shift of the valence band maximum due to Te incorporation could improve p-type doping efficiency. The resistivity was found to be less than 100 Ωcm for the layers with 0.2 < x < 0.3, which are suggested to be p-type from the currentvoltage (I – V) characteristic and the electron-beam induced current. For further characterization, ZnSTe:N/n-ZnS diode structures have been fabricated. It was found that the diode exhibits clear rectification in I – V characteristic, and blue-green electroluminescence probably due to hole injection from the ZnSTe:N layer into the n-ZnS layer. These results indicate p-type conduction in ZnSTe:N, and thus the light-emitting diode operation in the ZnS-based pn-junctions. (© 2014 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim)