Synthesis and properties of novel photosensitive poly(arylene ether sulfone) containing chalcone moiety in the main chain
Synthesis and properties of novel photosensitive poly(arylene ether sulfone) containing chalcone moiety in the main chain
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主链含查尔酮结构的新型光敏聚芳醚砜的合成及性能
DOI：
10.1016/j.matchemphys.2010.12.033
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发表时间：
2011-04
期刊：
影响因子：
--
通讯作者：
an Li
中科院分区：
文献类型：
--
作者：
Pushan Wen, Lei Wang,Aiqing Zhang,Xi;an Li
以4，4 ′-二羟基查耳酮（4DHC）、4，4 ′-二氟二苯砜（DFDPS）和双酚A（BPA）为原料，合成了一系列主链含查耳酮结构的光敏聚芳醚砜。用1H NMR、FT-IR、UV、TGA和DSC等手段对聚合物进行了表征。聚合物在高达400°C下是稳定的，这表明聚合物具有良好的热性能。发现聚合物可溶于极性溶剂和氯化溶剂。然而，聚合物不溶于烃和含羟基的溶剂中。在紫外光照射后，在不存在光引发剂或感光剂的情况下，聚合物薄膜发生交联，得到不溶的薄膜。并对光交联速率进行了研究和讨论。
A new series of photosensitive poly(arylene ether sulfone)s containing chalcone moiety in the main chain were synthesized from 4,4′-dihydroxychalcone (4DHC), 4,4′-difluorodiphenylsulfone (DFDPS) and bisphenol A (BPA). This series of polymers were characterized by1H NMR, FT-IR, UV spectroscopy, thermogravimetric analysis (TGA) and differential scanning calorimetry (DSC). The polymers were stable up to 400°C, which indicates that the polymers possess good thermal properties. The polymers were found to be soluble in polar solvents and chlorinated solvents. However, the polymers were insoluble in hydrocarbons and in hydroxyl group-containing solvents. After the irradiation of UV light, the thin polymer film was crosslinked to give an insoluble film in the absence of a photoinitiator or sensitizers. The rate of photocrosslinking was also examined and discussed.
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