An XPS study of Au alloyed Al-O sputtered coatings
An XPS study of Au alloyed Al-O sputtered coatings
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DOI：
10.1016/j.apsusc.2011.01.104
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发表时间：
2011-04-15
影响因子：
6.7
通讯作者：
Cavaleiro, A.
中科院分区：
文献类型：
--
作者：
Figueiredo, N. M.;Carvalho, N. J. M.;Cavaleiro, A.
本研究的重点是X射线光电子能谱（XPS）分析的薄膜组成的Au金属团簇嵌入在介电基质的Al-O涂层。通过在反应气氛中共溅射Al + Au靶来沉积涂层，其中Au含量高达8原子%。Al-O基体在1000 ℃退火后仍保持非晶态。在沉积的薄膜中，通过XPS证明存在尺寸小于1-2 nm的Au团簇（未通过XRD检测到）。随着退火温度的升高，Au在介质基体中的聚集也被XPS证实，与XRD结果一致。(C)2011 Elsevier B. V.保留所有权利。
The focus of this research is the X-ray photoelectron spectroscopy (XPS) analysis of thin films consisting of Au metal clusters embedded in a dielectric matrix of Al-O coatings. The coatings were deposited by co-sputtering an Al + Au target in a reactive atmosphere with Au contents up to 8 at.%. The Al-O matrix was kept amorphous even after annealing at 1000 degrees C. In the as-deposited films the presence of Au clusters with sizes smaller than 1-2 nm (not detected by XRD) was demonstrated by XPS. With increasing annealing temperature, Au clustering in the dielectric matrix was also confirmed by XPS, in agreement with XRD results. (C) 2011 Elsevier B.V. All rights reserved.