Depth profiling of organic films with X-ray photoelectron spectroscopy using C60+ and Ar+ co-sputtering.
Depth profiling of organic films with X-ray photoelectron spectroscopy using C60+ and Ar+ co-sputtering.
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使用 C60 和 Ar 共溅射,通过 X 射线光电子能谱对有机薄膜进行深度剖析。
DOI:
10.1021/ac702626n
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发表时间:
2008
影响因子:
7.4
通讯作者:
J. Shyue
中科院分区:
文献类型:
--
作者:
Bang;Ying;Wei;Mao;Shu;Wei;Yu‐Chin Lin;J. Jou;C. Chu;J. Shyue
By sputtering organic films with 10 kV, 10 nA C60+ and 0.2 kV, 300 nA Ar+ ion beams concurrently and analyzing the newly exposed surface with X-ray photoelectron spectroscopy, organic thin-film devices including an organic light-emitting diode and a polymer solar cell with an inverted structure are profiled. The chemical composition and the structure of each layer are preserved and clearly observable. Although C60+ sputtering is proven to be useful for analyzing organic thin-films, thick organic-devices cannot be profiled without the low-energy Ar+ beam co-sputtering due to the nonconstant sputtering rate of the C60+ beam. Various combinations of ion-beam doses are studied in this research. It is found that a high dosage of the Ar+ beam interferes with the C60+ ion beam, and the sputtering rate decreases with increasing the total ion current. The results suggest that the low-energy single-atom projectile can disrupt the atom deposition from the cluster ion beams and greatly extend the application of the cluster ion-sputtering. By achievement of a steady sputtering rate while minimizing the damage accumulation, this research paves the way to profiling soft matter and organic electronics.