Nanosphere lithography from template-directed colloidal sphere assemblies.
Nanosphere lithography from template-directed colloidal sphere assemblies.
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DOI：
10.1166/jnn.2006.227
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发表时间：
2006-06
影响因子：
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通讯作者：
Q. Yan;Ao Chen;S. Chua;X. S. Zhao
中科院分区：
文献类型：
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作者：
Q. Yan;Ao Chen;S. Chua;X. S. Zhao
传统的奈米球光刻技术的缺点是无法精确控制奈米结构的形状与结构。在这项工作中，纳米压印光刻技术被用于在涂覆在硅衬底上的聚合物薄膜上构建各种所需的图案。然后将这些图案用作模板来指导二氧化硅胶体球的自组装，形成具有良好控制的大小、形状和结构的胶体组件。随后使用模板导向胶体球组件的纳米球光刻产生了传统纳米球光刻方法无法获得的复杂纳米结构。
Conventional nanosphere lithography holds the drawbacks of lacking precise control over the shape and architecture of the resultant nanostructures. In this work, nanoimprinting lithography was used to construct various desired patterns on a polymer film coated on a silicon substrate. The patterns were then used as templates to direct the self-assembly of silica colloidal spheres, forming colloidal assemblies with well-controlled sizes, shapes, and structures. Subsequent nanosphere lithography using template-directed colloidal sphere assemblies resulted in complex nanostructures that can not be obtained using the conventional nanosphere lithography method.