Preparation of an ultra-clean and atomically controlled hydrogen-terminated Si(111)-(1x1) surface revealed by HREELS, AFM and STM : aqueous NH4F etching process of Si(111)
Preparation of an ultra-clean and atomically controlled hydrogen-terminated Si(111)-(1x1) surface revealed by HREELS, AFM and STM : aqueous NH4F etching process of Si(111)
复制标题
HREELS、AFM 和 STM 揭示超洁净原子控制氢封端 Si(111)-(1x1) 表面的制备：Si(111) 的水基 NH4F 蚀刻工艺
DOI：
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发表时间：
2007
期刊：
影响因子：
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通讯作者：
A.Kasuya et al.
中科院分区：
文献类型：
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作者：
Yasunobu;Maeda;Norio;Kurita;A.Kasuya et al.
