Review of fabrication and characterization of Nd-Fe-B thick films for magnetic micromachines
Review of fabrication and characterization of Nd-Fe-B thick films for magnetic micromachines
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DOI：
10.1109/tmag.2007.893778
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发表时间：
2007-06-01
影响因子：
2.1
通讯作者：
Fukunaga, H.
中科院分区：
文献类型：
--
作者：
Nakano, M.;Sato, S.;Fukunaga, H.
采用高速脉冲激光沉积法和后退火方法制备了各向同性 Nd-Fe-B 厚膜磁体。成功实现了90μm/h的沉积速率，并采用脉冲退火作为后退火工艺以增强矫顽力。在高沉积速率下使用基底加热系统使我们能够获得(BH)(max)约为120 kJ/m(3)的各向异性厚膜，这显示出改善微机械性能的潜力。介绍了包含各向同性薄膜的新型微型机器。
Isotropic Nd-Fe-B thick film magnets were prepared by a high-speed pulsed laser deposition method followed by a post annealing. The deposition rate of 90 mu m/h could be successfully achieved, and a pulse annealing was adopted as the post annealing process in order to enhance coercivity. Use of a substrate heating system under the high deposition rate enabled us to obtain anisotropic thick films with (BH)(max) of approximately 120 kJ/m(3), which show the potential for an improvement in the properties of the micromachines. Novel micromachines comprising the isotropic films were introduced.