Snowplow effect and reactive diffusion in the Pt doped Ni–Si system
Snowplow effect and reactive diffusion in the Pt doped Ni–Si system
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Pt 掺杂 Ni-Si 体系中的扫雪机效应和反应扩散
DOI：
10.1016/j.scriptamat.2007.05.007
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发表时间：
2007
影响因子：
6
通讯作者：
C. Perrin
中科院分区：
文献类型：
--
作者：
O. Cojocaru;D. Mangelinck;K. Hoummada;E. Cadel;D. Blavette;B. Deconihout;C. Perrin
采用飞秒激光辅助的大角度原子探针层析技术，分析了Pt在290°C热处理1h后的再分布。在Ni和Pt的固溶体中发现了Ni_2Si和NiSi两种硅化物。Pt在Ni 1 −xPtx/Ni 2Si界面的重新分布清楚地说明了雪犁效应。Pt在Ni 2Si/NiSi界面的偏析已被观察到，并归因于界面偏析。
The redistribution of Pt after heat treatment at 290°C for 1h has been analyzed by large-angle atom probe tomography assisted by femtosecond laser pulses. Two silicides Ni2Si and NiSi were found together with the solid solution of Ni and Pt. The redistribution of Pt at the Ni1−xPtx/Ni2Si interface is a clear illustration of the snowplow effect. A segregation of Pt at the Ni2Si/NiSi interface has been observed and is attributed to interfacial segregation.