Surface Integrity of Diamond Turned (100)Ge
Surface Integrity of Diamond Turned (100)Ge
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DOI：
10.1016/j.procir.2022.03.103
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发表时间：
2022
期刊：
影响因子：
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通讯作者：
M. Tunesi;D. Lucca;M. Davies;A. Zare;M. C. Gordon;N. Sizemore;Y.Q. Wang
中科院分区：
文献类型：
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作者：
M. Tunesi;D. Lucca;M. Davies;A. Zare;M. C. Gordon;N. Sizemore;Y.Q. Wang
研究了离轴单点金刚石车削(100)Ge的表面完整性。在标称切割深度为10μm时，使用9和20μm/rev来改变进给速度。用相干扫描干涉法和原子力显微镜测量表面形貌。用沟道卢瑟福背散射光谱和拉曼光谱研究了产生的近表面晶格无序。用等效非晶层厚度和最小沟道屈服来量化近表面晶格无序度。将得到的表面完整性与化学机械抛光和磁流变抛光形成的表面进行了比较。
The resulting surface integrity of (100)Ge subjected to off-axis single point diamond turning was investigated. Feedrate was varied using 9 and 20 μm/rev at 10 μm nominal depth of cut. Surface topography was measured with coherence scanning interferometry and atomic force microscopy. The resulting near surface lattice disorder was investigated with channeling Rutherford Backscattering Spectrometry and Raman Spectroscopy. Measured near surface lattice disorder was quantified in terms of equivalent amorphous layer thickness and minimum channeling yield. A comparison of the resulting surface integrity was made with surfaces created by chemomechanical polishing and magnetorheological finishing.