Mechanism of elemental mercury oxidation over copper-based oxide catalysts: Kinetics and transient reaction studies
Mechanism of elemental mercury oxidation over copper-based oxide catalysts: Kinetics and transient reaction studies
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铜基氧化物催化剂上元素汞的氧化机理:动力学和瞬态反应研究
DOI:
10.1021/acs.iecr.9b04806
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发表时间:
2020-01
影响因子:
4.2
通讯作者:
Yang Shijian
中科院分区:
文献类型:
--
作者:
Zhang Qi;Mei Jian;Sun Pengxiang;Zhao Hui;Guo Yongfu;Yang Shijian
Purposefully improving the performances of copper-based oxides for Hg-0 oxidation was beset with difficulties due to their vagueness of Hg-0 oxidation mechanism. In this study, Hg-0 oxidation mechanism over CuO/TiO2 was deeply investigated by Hg balance, kinetics, and transient reaction. HgO adsorbed on CuO/TiO2 scarcely reacted with gaseous HCl to form HgCl2, so the Mars-Maessen mechanism scarcely contributed to Hg-0 oxidation over CuO/TiO2. The reaction order of He oxidation over CuO/TiO2 at 300-400 degrees C with respect to the gaseous Hg-0 concentration was much less than 1, so neither the Deacon mechanism nor the Eley- Rideal mechanism predominated over Hg-0 oxidation over CuO/TiO2. As the contributions of other three mechanisms to Hg-0 oxidation over CuO/TiO2 were all ruled out, Hg-0 oxidation over CuO/TiO2 mainly followed the Langmuir-Hinshelwood mechanism, which can reasonably explain all the experimental phenomena of Hg-0 oxidation over CuO/TiO2.
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影响因子:
11.4
作者:
Xiong Shangchao;Xiao Xin;Huang Nan;Dang Hao;Liao Yong;Zou Sijie;Yang Shijian
通讯作者:
Yang Shijian
影响因子:
12.9
作者:
Feng Wang;R. Büchel;A. Savitsky;Michal Zalibera;D. Widmann;S. Pratsinis;W. Lubitz;F. Schüth
通讯作者:
Feng Wang;R. Büchel;A. Savitsky;Michal Zalibera;D. Widmann;S. Pratsinis;W. Lubitz;F. Schüth
影响因子:
15.1
作者:
Bo Zhao;Xiaowei Liu;Zijian Zhou;Haizhong Shao;Minghou Xu
通讯作者:
Minghou Xu
影响因子:
4.2
作者:
Kamata, Hiroyuki;Ueno, Shun-ichiro;Yukimura, Akinori
通讯作者:
Yukimura, Akinori
影响因子:
15.1
作者:
A. Beretta;N. Usberti;L. Lietti;P. Forzatti;M. D. Blasi;A. Morandi;C. L. Marca
通讯作者:
A. Beretta;N. Usberti;L. Lietti;P. Forzatti;M. D. Blasi;A. Morandi;C. L. Marca