Nanofacet lithography: A new bottom-up approach to nanopatterning and nanofabrication by soft replication of spontaneously faceted crystal surfaces
Nanofacet lithography: A new bottom-up approach to nanopatterning and nanofabrication by soft replication of spontaneously faceted crystal surfaces
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DOI：
10.1002/adma.200601625
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发表时间：
2007-05-21
影响因子：
29.4
通讯作者：
Joselevich, Ernesto
中科院分区：
文献类型：
--
作者：
Gabai, Rachel;Ismach, Ariel;Joselevich, Ernesto
不稳定晶体表面的刻面化提供了用于软光刻的自组装模板，使得能够容易地生成An和Si的各种周期性纳米图案化单层、纳米线、纳米凹槽、纳米网格和双金属化层（该图示出了刻面蓝宝石到弹性体印模的复制，然后到图案化的自组装单层）。
The faceting of unstable crystal surfaces provides self-assembling templates for soft lithography, enabling the facile generation of a variety of periodic nanopatterned monolayers, nanowires, nanogrooves, nanogrids, and nanowaffles of An and Si (the figure shows the replication of faceted sapphire to an elastomeric stamp, and then to a patterned self-assembled monolayer).