Microstructured reaction areas for the deposition of silica
Microstructured reaction areas for the deposition of silica
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用于沉积二氧化硅的微结构反应区域
DOI：
10.1007/s00396-007-1773-y
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发表时间：
2008
影响因子：
2.4
通讯作者：
Menzel H
中科院分区：
文献类型：
--
作者：
Helmecke O;Hirsch A;Behrens P;Menzel H
Patterned films with hexagonal structures were prepared by photochemical grafting of hydrophobic poly(acrylic acid 2-ethyl-hexylester) (PEHAA) as barrier and poly(ethylene imine) (PEI) as reaction area. The films have been characterized by ellipsometry, contact angle measurements, and scanning electron microscopy (SEM). These patterned films have been used in silica mineralization experiments by dipping them into a silica precursor solution. Silica deposition occurs only in PEI-coated areas, resulting in regular arrays of lens-shaped silica particles. The deposited silica was investigated by SEM and atomic force microscopy (AFM).
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影响因子：
13.3
作者：
Kim, DJ;Lee, KB;Choi, IS
通讯作者：
Choi, IS
用于控制内皮细胞粘附的表面附着的聚合物单层
DOI：
--
发表时间：
2002
期刊：
影响因子：
--
作者：
B. Chang;O. Prucker;E. Groh;Anja Wallrath;M. Dahm;J. Rühe
通讯作者：
J. Rühe
影响因子：
9.9
作者：
LINDQUIST, GM;STRATTON, RA
通讯作者：
STRATTON, RA
微结构反应区域的形状和表面性质对二氧化硅沉积的影响
影响因子：
2.4
作者：
Helmecke O;Menneking C;Behrens P;Menzel H
通讯作者：
Menzel H