Extraordinary optical absorption through subwavelength slits.
Extraordinary optical absorption through subwavelength slits.
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DOI：
10.1364/ol.34.000686
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发表时间：
2009-03
期刊：
影响因子：
3.6
通讯作者：
Justin S. White;G. Veronis;Zongfu Yu;E. Barnard;A. Chandran;S. Fan;M. Brongersma
中科院分区：
文献类型：
--
作者：
Justin S. White;G. Veronis;Zongfu Yu;E. Barnard;A. Chandran;S. Fan;M. Brongersma
我们报告了共振等离子体狭缝的能力，有效地将电磁能集中到狭缝内部或正后方的纳米级吸收材料中。这就产生了以吸收增强因子为特征的非凡光吸收，其吸收增强因子远远超过了通过狭缝的非凡光传输所看到的增强。建立了谐振吸收的半解析法布里-珀罗模型，该模型在定量上与全场模拟结果一致。我们发现，在633 nm处，硅填充铝膜的缝隙可以实现近1000%的吸收增强。这种效应可用于广泛的应用，包括高速光电探测器，光学光刻和记录，以及生物传感器。
We report on the ability of resonant plasmonic slits to efficiently concentrate electromagnetic energy into a nanoscale volume of absorbing material placed inside or directly behind the slit. This gives rise to extraordinary optical absorption characterized by an absorption enhancement factor that well exceeds the enhancements seen for extraordinary optical transmission through slits. A semianalytic Fabry-Perot model for the resonant absorption is developed and shown to quantitatively agree with full-field simulations. We show that absorption enhancements of nearly 1000% can be realized at 633 nm for slits in aluminum films filled with silicon. This effect can be utilized in a wide range of applications, including high-speed photodetectors, optical lithography and recording, and biosensors.