Structure, composition, and mechanical characterization of dc sputtered TiN-MoS2 nanocomposite thin films
Structure, composition, and mechanical characterization of dc sputtered TiN-MoS2 nanocomposite thin films
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DOI：
10.1016/j.surfcoat.2011.01.044
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发表时间：
2011-03
影响因子：
5.4
通讯作者：
G. Strapasson;P. Badin;G. Soares;G. Machado;C. Figueroa;R. Hübler;Alexandre Luís Gasparin;I. Baumvol;C. Aguzzoli;E. Tentardini
中科院分区：
文献类型：
--
作者：
G. Strapasson;P. Badin;G. Soares;G. Machado;C. Figueroa;R. Hübler;Alexandre Luís Gasparin;I. Baumvol;C. Aguzzoli;E. Tentardini
研究了通过直流磁控溅射沉积的 MoS2 浓度为 3 至 40at.% 的 TiN-MoS2 复合薄膜。在磨损之前和之后测定元素组成和形成的化合物。研究了复合薄膜的晶体结构，并通过透射电子显微镜对 TiN 基体中沉淀物的性质和浓度进行了成像。通过纳米压痕测量薄膜的硬度和弹性模量，并根据这两个量值计算失效弹性应变。薄膜共沉积过程中复合涂层中形成的MoS2尺寸为纳米级，分布均匀，大部分为非晶态，但也有部分为晶态。目前的研究并没有证实在晶界处形成MoS2，也没有证实通过用S替代TiN基体中的N来形成TiS。目前 MoS2 浓度高达 4% 的 TiN-MoS2 薄膜复合涂层的硬度和弹性失效应变相当高。根据这些发现讨论了潜在的应用。
TiN-MoS2composite thin films deposited by dc magnetron sputtering with MoS2concentrations from 3 to 40at.% were investigated. The elementary composition and the formed compounds were determined before and after wear. The crystalline structure of the composite thin films was accessed and the nature and concentration of the precipitates in the TiN matrix were imaged by transmission electron microscopy. The hardness and elastic moduli of the films were measured by nanoindentation and the elastic strain to failure calculated on the basis of these two magnitudes. The MoS2formed in the composite coatings during thin film co-deposition are nanoscopic in size, homogeneously distributed, and mostly amorphous, although part of them are crystalline. The present study does not confirm MoS2formation at grain boundaries or TiS formation by substitution of S for N in the TiN matrix. The hardness and elastic strain to failure are appreciably high for the present TiN-MoS2thin film composite coatings with MoS2concentrations up to 4%. The potential applications are discussed on the basis of these findings.