Hardness enhancement by compositionally modulated structure of Ti/TiN multilayer films
Hardness enhancement by compositionally modulated structure of Ti/TiN multilayer films
复制标题
DOI：
10.1116/1.581273
复制
发表时间：
1998-10
期刊：
影响因子：
--
通讯作者：
E. Kusano;Masaru Kitagawa;H. Nanto;A. Kinbara
中科院分区：
文献类型：
--
作者：
E. Kusano;Masaru Kitagawa;H. Nanto;A. Kinbara
本文研究了成分调制Ti/TiN多层膜结构对其硬度的影响。采用Ti金属靶和Ar-N2混合气体作为反应气体，采用磁控溅射法在硼硅酸盐玻璃衬底上制备了Ti/TiN多层膜。在该方法中，通过计算机控制的质量流量控制器改变N2气体流速以产生具有变化的组成分布的膜。用纳米压痕法测量了薄膜的硬度。通过俄歇电子能谱和X射线光电子能谱估计膜的组成深度分布。还沉积了TiN单层膜以比较其与Ti/TiN多层膜的硬度。本研究中检测的调制周期为10、15、20和40 nm。结果表明，调制周期为20 nm的薄膜硬度最高可达29 GPa，且薄膜具有较好的光学性能。
In this article results of an investigation into effects of multilayer structures of compositionally modulated Ti/TiN films on their hardness is presented. Compositionally modulated Ti/TiN multilayer films were deposited onto borosilicate glass substrates by a reactive gas flow rate modulation magnetron sputtering method using a combination of a Ti metal target and an Ar–N2 mixture discharge gas. In this method, a N2 gas flow rate was changed by a computer-controlled mass flow controller to produce films with a varying composition distribution. The film hardness was measured by nanoindentation. The film composition depth profiles were estimated by Auger electron spectroscopy and x-ray photoelectron spectroscopy. A TiN single layer film was also deposited to compare its hardness with those of the Ti/TiN multilayer films. Modulation periods examined in this study were 10, 15, 20, and 40 nm. It was found that the film with a modulation period of 20 nm showed a maximum hardness of 29 GPa and that the films wi...