Thermodynamic and kinetic considerations on the equilibrium shape for thermally induced microdefects in Czochralski silicon
Thermodynamic and kinetic considerations on the equilibrium shape for thermally induced microdefects in Czochralski silicon
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DOI：
10.1063/1.336908
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发表时间：
1986-05
影响因子：
3.2
通讯作者：
W. Tiller;S. Hahn;F. Ponce
中科院分区：
文献类型：
--
作者：
W. Tiller;S. Hahn;F. Ponce
使用热力学和动力学的考虑，我们解释了准平衡，形态和结构特性的热诱导氧化物沉淀直拉硅。一个模型的基础上形成的Frenkel缺陷在硅/二氧化硅界面被用来解释实验观察到的沉淀物的形状：1110埃柯石英棒，（100）玻璃质二氧化硅盘，和二氧化硅多面体在低，中，高温下，分别。
Using thermodynamic and kinetic considerations, we explain the quasiequilibrium, morphological, and structural characteristics of thermally induced oxide precipitates in Czochralski silicon. A model based upon the formation of Frenkel defects at the silicon/silica interface is used to explain the experimentally observed precipitate shapes: 〈110〉 coesite rods, (100) vitreous silica discs, and silica polyhedra at low, intermediate, and high temperatures, respectively.