Crystal structures and band offsets of ultrathin HfO2–Y2O3 composite films studied by photoemission and x-ray absorption spectroscopies
Crystal structures and band offsets of ultrathin HfO2–Y2O3 composite films studied by photoemission and x-ray absorption spectroscopies
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DOI：
10.1063/1.2364601
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发表时间：
2006-10
影响因子：
4
通讯作者：
M. Komatsu;R. Yasuhara;H. Takahashi;S. Toyoda;H. Kumigashira;M. Oshima;D. Kukuruznyak;T. Chikyow
中科院分区：
文献类型：
--
作者：
M. Komatsu;R. Yasuhara;H. Takahashi;S. Toyoda;H. Kumigashira;M. Oshima;D. Kukuruznyak;T. Chikyow
本文用光电子能谱和X射线吸收谱研究了HfO_2-Y_2O_3复合薄膜的晶化和能带偏移随Y_2O_3组分的变化。作者发现，用XAS中540 ~ 550 eV的详细光谱结构可以预测薄膜的晶体结构。光电子能谱和X射线吸收光谱表明，x=0和0.05的薄膜主要为单斜相，而x=0.10和0.20的薄膜主要为立方相。无论通过向HfO 2中添加Y2 O3改变晶体结构，带隙和带偏移几乎保持不变。
The authors have investigated ultrathin HfO2–Y2O3 composite films by photoemission spectroscopy and x-ray absorption spectroscopy (XAS) to elucidate the Y2O3 composition dependence of crystallization and band offsets. The authors have found that the crystal structure of ultrathin films can be predicted by the detailed spectral structure between 540 and 550eV in XAS. Photoemission spectroscopy and XAS reveal that the films of x=0 and 0.05 are mainly in a monoclinic phase, while those of x=0.10 and 0.20 are in a cubic phase. Regardless of the crystal structure changes by adding Y2O3 to HfO2, the band gap and band offsets remain almost unchanged.