Work Functions of the transition Metals and Metal Silicides
Work Functions of the transition Metals and Metal Silicides
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DOI：
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发表时间：
1999-02
影响因子：
3.2
通讯作者：
T. Drummond
中科院分区：
文献类型：
--
作者：
T. Drummond
多晶金属的功函数经常被用来系统化肖特基势垒高度数据，以便对半导体的接触进行整流。硅器件的整流触点主要使用具有功函数的导电金属硅化物形成，而功函数的特性不如金属功函数。目前的工作有两个目标。首先，利用金属功函数和原子化学势之间的关系对过渡金属进行分类。其次，收集了金属硅化物的现有数据，并用平均电荷转移(ACT)模型进行了解释。ACT模型除了考虑化学势外，还考虑了组成元素的电子硬度。发现了硅化物功函数行为的新趋势。
The work functions of polycrystalline metals are often used to systematize Schottky barrier height data for rectifying contacts to semiconductors. Rectifying contacts to silicon devices are predominantly formed using conductive metal silicides with work functions which are not as well characterized as metal work functions. The present work has two objectives. First, it classifies the transition metals using correlations between the metal work function and the atomic chemical potential. Second, the available data for metal silicides is collected and interpreted using an average charge transfer (ACT) model. The ACT model accounts for the electronic hardness of the component elements in addition to their chemical potentials. New trends in the behavior of silicide work functions are identified.