Focusing mirror for x-ray free-electron lasers
Focusing mirror for x-ray free-electron lasers
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DOI：
10.1063/1.2964928
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发表时间：
2008-08-01
影响因子：
1.6
通讯作者：
Yamauchi, Kazuto
中科院分区：
文献类型：
--
作者：
Mimura, Hidekazu;Morita, Shinya;Yamauchi, Kazuto
我们展示了用于将 X 射线自由电子激光束聚焦到纳米尺寸的大型全反射镜的设计、制造和评估。我们使用硅制成的椭圆聚焦镜，长 400 毫米，焦距为 550 修剪。电解在线修整磨削用于初始成形，弹性发射加工用于最终成形和表面平滑。整个区域的峰谷高度达到 2 nm 的图形精度。聚焦光束的表征是在 SPring-8 的 BL29XUL 上进行的。 15 keV 时聚焦光束尺寸为 75 nm，几乎等于理论尺寸。 (C) 2008 年美国物理研究所。
We present the design, fabrication, and evaluation of a large total-reflection mirror for focusing x-ray free-electron laser beams to nanometer dimensions. We used an elliptical focusing mirror made of silicon that was 400 mm long and had a focal length of 550 trim. Electrolytic in-process dressing grinding was used for initial-step figuring and elastic emission machining was employed for final figuring and surface smoothing. A figure accuracy with a peak-to-valley height of 2 nm was achieved across the entire area. Characterization of the focused beam was performed at BL29XUL of SPring-8. The focused beam size was 75 nm at 15 keV, which is almost equal to the theoretical size. (C) 2008 American Institute of Physics.