Third-order nonlinear optical properties of thin sputtered gold films
Third-order nonlinear optical properties of thin sputtered gold films
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DOI：
10.1016/j.optcom.2007.02.059
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发表时间：
2007-07
影响因子：
2.4
通讯作者：
E. Xenogiannopoulou;P. Aloukos;S. Couris;E. Kamińska;A. Piotrowska;E. Dynowska
中科院分区：
文献类型：
--
作者：
E. Xenogiannopoulou;P. Aloukos;S. Couris;E. Kamińska;A. Piotrowska;E. Dynowska
用溅射法在石英衬底上制备了厚度为5 ~ 52 nm的Au薄膜，并利用光学克尔效应（OKE）和Z-扫描技术研究了它们在532 nm、35 ps激光脉冲下的三阶非线性光学响应。所有制备的薄膜都通过XRD、AFM和UV-VIS-NIR分光光度法进行了表征，同时测量了它们的三阶磁化率χ（3），发现其数量级为10− 9 esu。三阶极化率的真实的实部和虚部与实验结果和Smith等人[D.D.史密斯，Y. Yoon，R.W. Boyd，Y.K.洛杉矶坎贝尔Baker，R.M.克鲁克斯，M.乔治，应用物理学杂志86（1999）6200]。
Au films of thickness ranging between 5 and 52nm were prepared by sputtering on quartz substrates and their third-order nonlinear optical response was investigated by Optical Kerr effect (OKE) and Z-scan techniques using 532nm, 35ps laser pulses. All prepared films were characterized by XRD, AFM and UV–VIS–NIR spectrophotometry while their third-order susceptibility χ(3)was measured and found to be of the order of 10−9esu. The real and imaginary parts of the third-order susceptibility were found in very good agreement with experimental results and theoretical predictions reported by Smith et al. [D.D. Smith, Y. Yoon, R.W. Boyd, Y.K. Cambell, L.A. Baker, R.M. Crooks, M. George, J. Appl. Phys. 86 (1999) 6200].