PIC Simulation of Pseudospark Discharge-Based Plasma Cathode Electron Source for the Generation of High Current Density and Energetic Electron Beam

PIC Simulation of Pseudospark Discharge-Based Plasma Cathode Electron Source for the Generation of High Current Density and Energetic Electron Beam
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DOI:
10.1109/ted.2020.2971381
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发表时间:
2020-04-01
影响因子:
3.1
通讯作者:
Pal, Udit Narayan
Pal, Udit Narayan
中科院分区:
工程技术2区
文献类型:
--
作者:
Varun;Cross, A. W.;Pal, Udit Narayan

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基于我们的研究,在OOPIC PRO模拟程序的帮助下,提出了一种利用单间隙到多间隙伪火花放电(PD)产生高密度高能电子束的等离子体阴极电子(PCE)源。模拟模型包括单隙到多隙PD-PCE源的连续高压击穿和等离子体放电过程。本文对单间隙到多间隙Pd-PCE源进行了联合分析,其工作气压为20-60帕,外加电压为20-35千伏,电极孔径为2-6 mm,可产生适合于极紫外(EUV)/软X射线、微波和表面修饰等潜在和发展应用的脉冲电子束。触发电子被用来在中空阴极腔内形成受控和高效的等离子体。产生的高密度A/cm(2)和高达32千伏的电子束由穿透的动态等势线控制。电子束电流随气压和间隙数的增加而增大,随Pd-PCE源电极孔径的增大而减小。这项研究通过优化Pd-PCE源的操作和几何参数,帮助产生了所需的电子束。
A plasma cathode electron (PCE) source using single-gap to multigap pseudospark discharge (PD) for the generation of high density and energetic electron beams has been proposed based on our study with the help of OOPIC PRO simulation code. The simulation model comprises the successive high voltage breakdown and plasma discharge processes for single-gap to multigap PD-PCE sources. A combined analysis of a single gap to multigap PD-PCE source with the operating gas pressures 20-60 Pa, the applied voltages 20-35 kV, and the electrode aperture sizes 2-6 mm for the generation of pulsed electron beams suitable for potential and growing applications in extreme ultraviolet (EUV)/Soft X-ray, microwave, and surface modification is presented. Trigger electrons are used to form the controlled and efficient plasma inside the hollow cathode cavity. The generated high density A/cm(2)) and up to 32-kV electron beams are governed by the penetrated dynamic equipotential lines. The electron beam current increases with the increase of gas pressure and the number of gaps and decreases for the increase in the diameter of the electrode apertures of the PD-PCE source. The investigation has helped to generate the required electron beam by optimizing the operating and geometrical parameters of the PD-PCE source.