Study of HfO2/SiO2 dichroic laser mirrors with refractive index inhomogeneity.
Study of HfO2/SiO2 dichroic laser mirrors with refractive index inhomogeneity.
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DOI：
10.1364/ao.53.000a56
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发表时间：
2014-02
期刊：
影响因子：
1.9
通讯作者：
Hongfei Jiao;Xinbin Cheng;Ganghua Bao;Jin Han;Jinlong Zhang;Zhanshan Wang;M. Trubetskov;A. Tikhonravov
中科院分区：
文献类型：
--
作者：
Hongfei Jiao;Xinbin Cheng;Ganghua Bao;Jin Han;Jinlong Zhang;Zhanshan Wang;M. Trubetskov;A. Tikhonravov
HfO 2/SiO2分色镜在1064 nm处具有高反射率，在532 nm处具有高透射率，在高功率激光系统中起着重要作用。然而，半波洞效应主要是由氧化硅的折射率不均匀性引起的，它影响了这些反射镜的光谱和应用。提出了两种消除半波孔效应的方法。这两种方法都试图将半波孔的位置与原始波长进行比较。一种方法拓宽了第一谐波波长的反射带，同时将中心反射带调整到更长的波长，而另一种方法将两种堆叠相结合，以调整半波孔的位置远离感兴趣的波长。两种分色镜已成功地制造，而且，它被发现的方法的两个堆栈的组合，0.9（HL）8和1.1（HL）8，提供了设计，可以更容易地制造，并具有更好的质量光谱特性。
HfO2/SiO2 dichroic mirrors, having high reflectance at 1064 nm and high transmittance at 532 nm, play an important role in high-power laser systems. However, the half-wave hole effect, caused mainly by the refractive index inhomogeneity of hafnia, affects the spectra and application of these mirrors. Two approaches to eliminate the half-wave hole effect have been proposed. Both approaches attempt to shift the location of the half-wave hole in comparison with the original wavelength. One approach broadens the reflectance band of the first harmonic wavelength and simultaneously adjusts the central reflectance band to a longer wavelength, whereas the other approach combines the two stacks to adjust the location of the half-wave hole far away from the wavelength of interest. Two kinds of dichroic mirrors have been successfully fabricated; moreover, it was found that the method of a two-stack combination, 0.9(HL)8 and 1.1(HL)8, provides designs that can be fabricated more easily and with better quality spectral characteristics.