Extreme spore UV resistance of Bacillus pumilus isolates obtained from an ultraclean spacecraft assembly facility

Extreme spore UV resistance of Bacillus pumilus isolates obtained from an ultraclean spacecraft assembly facility
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DOI:
10.1007/s00248-003-1029-4
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发表时间:
2004-02-01
期刊:
影响因子:
3.6
通讯作者:
Nicholson, W
Nicholson, W
中科院分区:
生物学2区
文献类型:
--
作者:
Link, L;Sawyer, J;Nicholson, W

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Recent environmental microbial sampling of the ultra-clean Spacecraft Assembly Facility at NASA Jet Propulsion Laboratory (JPL-SAF) identified spores of Bacillus pumilus as major culturable bacterial contaminants found on and around spacecraft. As part of an effort to assess the efficacy of various spacecraft sterilants, purified spores of 10 JPL-SAF B. pumilus isolates were subjected to 254-nm UV and their UV resistance was compared to spores of standard B. subtilis biodosimetry strains. Spores of six of the 10 JPL-SAF isolates were significantly more resistant to UV than the B. subtilis biodosimetry strain, and one of the JPL-SAF isolates, B. pumilus SAFR-032, exhibited the highest degree of spore UV resistance observed by any Bacillus spp. encountered to date.