Potential Distribution in the End Region of the GAMMA10 Tandem Mirror Associated with Electron Flow Control
Potential Distribution in the End Region of the GAMMA10 Tandem Mirror Associated with Electron Flow Control
复制标题
与电子流控制相关的 GAMMA10 串联镜端部区域的电势分布
DOI：
10.1143/jpsj.66.3461
复制
发表时间：
1997
影响因子：
1.7
通讯作者：
T. Tamano
中科院分区：
文献类型：
--
作者：
Y. Yoshimura;T. Saito;Y. Kiwamoto;Y. Tatematsu;K. Kajiwara;Hidetoshi Miyaue;H. Abe;T. Tamano
在一个端部区域的伽马10串联镜的电位分布的研究与实验控制的电子流到一个浮动端板安装在真空室的端壁。端部区域具有开放场配置。为了通过抑制来自终板的二次电子发射来减少流向终板的热流，已经进行了网格偏置和热堤实验。研究了两个实验中轴向电位分布的变化。所观察到的变化与理论势模型的预测一致。该协议显示了强烈的二次电子上的电位分布在端部区域的影响，也表明，电位分布主要是由轴向粒子输运。在这项研究中，还显示了Yushmanov电子的产生。
Potential distribution in an end region of the GAMMA10 tandem mirror is investigated associated with experiments for control of an electron flow to a floating endplate installed on an end wall of the vacuum vessel. The end region has an open field configuration. Mesh bias and thermal dike experiments have been carried out in order to reduce a heat flow to the endplate by suppression of secondary electron emission from the endplate. Variations of the axial potential distribution in the two experiments are studied. The observed variations agree with predictions of a theoretical potential model. This agreement shows a strong effect of the secondary electrons on the potential distribution in the end region and also indicates that the potential distribution is predominantly determined by axial particle transport. In this study, production of Yushmanov electrons is also shown.