Magnetic Properties of Patterned Co/Pd Nanostructures by E-Beam Lithography and Ga Ion Irradiation
Magnetic Properties of Patterned Co/Pd Nanostructures by E-Beam Lithography and Ga Ion Irradiation
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电子束光刻和 Ga 离子辐照图案化 Co/Pd 纳米结构的磁性
DOI：
10.1109/tmag.2006.880076
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发表时间：
2006
影响因子：
2.1
通讯作者：
S. Iwata
中科院分区：
文献类型：
--
作者：
E. Suharyadi;T. Kato;S. Tsunashima;S. Iwata
利用电子束光刻和Ga离子辐照的方法，成功地制备了图案化的Co/Pd垂直磁性多层膜。横向尺寸为200~500 nm的垂直磁化正方形比特通过离子辐照面积分开。磁力显微镜图像显示，大多数尺寸为200 nm的图案化方形比特具有均匀的亮或暗的磁对比度。图案化Co/Pd薄膜的磁化曲线受位尺寸和位间距的影响较大，表明位与位之间存在通过辐照间距的交换耦合。研究发现，在离子辐照介质中，降低辐照区域的交换刚度是获得高密度的关键。
Patterned Co/Pd perpendicular magnetic multilayers using e-beam lithography followed by Ga ion irradiation have been successfully fabricated. Perpendicularly magnetized squared-bits with lateral sizes of 200 to 500 nm were separated by ion-irradiated area. magnetic force microscopy images showed that the most of the patterned squared-bits with size of 200 nm have either uniformly bright or dark magnetic contrasts. Magnetization curves of patterned Co/Pd films were strongly influenced by the bit size and spacing between bits and indicated the existence of exchange coupling between the bits via irradiated spacing. The reduction of exchange stiffness of irradiated area was found to be crucial, to achieve high density in ion-irradiated media
FIB 辐照 Co/Pd 多层薄膜的微观结构和磁性能
DOI：
--
发表时间：
2005
期刊：
IEEE Trans. Magn. 41-10
影响因子：
--
作者：
Kamita;O.;Edi Suharyadi et al.
通讯作者：
Edi Suharyadi et al.