Application of focused ion beam lift-out specimen preparation to TEM, SEM, STEM, AES and SIMS analysis
Application of focused ion beam lift-out specimen preparation to TEM, SEM, STEM, AES and SIMS analysis
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DOI：
10.1002/sia.1063
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发表时间：
2001-05-01
影响因子：
1.7
通讯作者：
Purcell, BM
中科院分区：
文献类型：
--
作者：
Stevie, FA;Vartuli, CB;Purcell, BM
空间分辨率为 5-7 nm 的市售聚焦离子束 (FIB) 工作站可以制备具有出色横向分辨率的样本。此功能已被半导体行业广泛利用，以从不断缩小的区域获取材料特性。 FIB已被普遍采用作为扫描电子显微镜（SEM）和透射电子显微镜（TEM）的制备工具。制备可从大量样品中取出的特定位点样品的能力提供了增强的 SEM 和 TEM 分析以及其他分析工具的新方法。专用扫描透射电子显微镜 (STEM) 可以提供几微米厚样品的图像。俄歇电子能谱 (AES) 可以提高分析识别小颗粒的能力。二次离子质谱 (SIMS) 可以提供高质量分辨率的痕量分析。 FIB 工作站的自动操作允许在没有操作员在场的情况下创建多个提取样品。版权所有 (C) 2001 John Wiley & Sons, Ltd.
Commercially available focused ion beam (FIB) workstations with spatial resolution of 5-7 nm can prepare specimens with excellent lateral resolution. This capability has been utilized extensively by the semiconductor industry to obtain materials characterization from continually smaller areas. The FIB has been adopted generally as a preparation tool for scanning electron microscopy (SEM) and transmission electron microscopy (TEM). The ability to prepare site-specific specimens that can be removed from the bulk of a sample provides enhanced SEM and TEM analyses and new approaches for other analytical tools. Dedicated scanning transmission electron microscopy (STEM) can provide images through samples several micrometers thick. Auger electron spectroscopy (AES) can analyze with improved ability to identify a small particle. Secondary ion mass spectrometry (SIMS) can provide trace analysis at high mass resolution. Automatic operation of FIB workstations permits the creation of multiple lift-out samples without the presence of an operator. Copyright (C) 2001 John Wiley & Sons, Ltd.