Low-κ nanocomposite films based on polyimides with grafted polyhedral oligomeric silsesquioxane
Low-κ nanocomposite films based on polyimides with grafted polyhedral oligomeric silsesquioxane
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DOI：
10.1002/app.22515
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发表时间：
2006-03-05
影响因子：
3
通讯作者：
Kang, ET
中科院分区：
文献类型：
--
作者：
Chen, YW;Chen, L;Kang, ET
以甲基丙烯酰基环戊基倍半硅氧烷（MA-POSS）为单体，经臭氧处理后与聚[N，N '-（1，4-亚苯基）-3，3'，4，4 '-二苯甲酮四羧酸酰胺酸]（PAA）进行热引发自由基接枝聚合，再经热亚胺化，制备了笼型倍半硅氧烷（R7 R' Si 8 O 12，POSS）接枝聚酰亚胺（PI）纳米复合材料。采用核磁共振（NMR）、X射线衍射（XRD）和热重分析（TGA）对接枝甲基丙烯酰环戊基-POSS侧链的PI（PI-g-PMAPOSS共聚物）的化学组成和结构进行了表征。在每个接枝PMA侧链的非晶PI膜的POSS分子保留了纳米多孔晶体结构，并形成了微晶的聚集体。PI-g-PMA-POSS纳米复合薄膜具有较低的介电常数和可调的介电常数，与原始PI薄膜相比。获得约3.0-2.2的介电常数（kappa’s）。本方法提供了一种基于现有PI制备低Kappa材料的方便方法。(c)2005 Wiley Periodicals，Inc.应用聚合物科学杂志99：2226-2232，2006
Nanocomposites of polyimides (PI) with covalently grafted polyhedral oligomeric silsesquioxane (R7R'Si8O12 or POSS) units were prepared by thermally-initiated free-radical graft polymerization of methacrylcyclopentyl-POSS (MA-POSS) with the ozone-pretreated poly[N,N'-(1,4-phenylene)-3,3',4,4'-benzophenonetetra-carboxylic amic acid] (PAA), followed by thermal imidization. The chemical composition and structure of the PI with grafted methacrylcyclopentyl-POSS side chains (PI-g-PMAPOSS copolymers) were characterized by nuclear magnetic resonance (NMR), X-ray diffraction (XRD), and thermogravimetric analysis (TGA). The POSS molecules in each grafted PMA side chain of the amorphous PI films retained the nanoporous crystalline structure, and formed an aggregate of crystallites. The PI-g-PMA-POSS nanocomposite films had both lower and tunable dielectric constants, in comparison with that of the pristine PI films. Dielectric constants (kappa'S) of about 3.0-2.2 were obtained. The present approach offers a convenient way for preparing low-kappa materials based on existing PI's. (c) 2005 Wiley Periodicals, Inc. J Appl Polym Sci 99: 2226-2232, 2006