Nano-particle size-dependent charging and electro-deposition in dielectric barrier discharges at atmospheric pressure for thin SiOx film deposition

Nano-particle size-dependent charging and electro-deposition in dielectric barrier discharges at atmospheric pressure for thin SiOx film deposition
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大气压力下介质阻挡放电中纳米颗粒尺寸相关的充电和电沉积用于 SiOx 薄膜沉积

DOI:
10.1088/0022-3727/40/14/009
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发表时间:
2007
期刊:
Journal of Physics D: Applied Physics
影响因子:
--
通讯作者:
J. Borra
J. Borra
中科院分区:
--
文献类型:
--
作者:
N. Jidenko;C. Jiménez;F. Massines;J. Borra

文献摘要

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本文研究了常压介质阻挡放电(DBD)在氮气中稀释的硅烷和氧化亚氮混合物中生成的纳米粒子的充电和电沉积,以沉积SiOx薄膜。比较了有无SiH4时的汤森放电(TD)和丝状放电(FD)。没有SiH4,粒子是通过灯丝-表面相互作用产生的。细丝-表面相互作用和等离子体-硅烷相互作用都通过成核和团聚导致了颗粒尺寸的双峰分布。对于SiH4,粒子的形成和生长暗示了TD和FD中相同的机制。FD中较快的动力学与比TD中更高的局部体积能量密度有关。从薄膜的扫描电子显微镜图像和DBD反应器下游的测量结果来看,生成的颗粒直径小于50 nm。利用交流电场中的集电解析模型,研究了纳米粒子的荷电行为。为了解释选择性电沉积导致50 nm以下的颗粒被包含在层中,以及在DBD下游测量到的颗粒尺寸分布,考虑了相同尺寸相关的颗粒的充电和电沉积,在TD和FD中具有不同的充电动力学。
This paper focuses on charging and electro-deposition of nano-particles produced in a mixture of silane and nitrous oxide diluted in N2, by dielectric barrier discharge (DBD) at atmospheric pressure for SiOx film deposition. Townsend discharge (TD) and filamentary discharge (FD) are compared with and without SiH4. Without SiH4, particles are produced by filament–surface interaction. Both filament–surface and plasma–silane interactions lead to bimodal particle size distributions from nucleation and agglomeration. With SiH4, particle formation and growth imply the same mechanisms in TD and FD. Faster dynamics in FD are related to higher local volume energy density than in TD. From scanning electron microscope images of the film and measurements downstream of the DBD reactor, the diameter of the particle produced is below 50 nm. An analytical model of electro-collection in an ac electric field is used to investigate nano-particle charging. To account for selective electro-deposition leading to particles smaller than 50 nm being included in the layer and to particle size distribution measured downstream of the DBD, the same size-dependent charging and electro-deposition of particle are involved, with different charging dynamics in TD and FD.