Chiral metal surfaces for enantioselective processes
Chiral metal surfaces for enantioselective processes
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DOI：
10.1038/s41563-020-0734-4
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发表时间：
2020-08-03
期刊：
影响因子：
41.2
通讯作者：
Gellman, Andrew J.
中科院分区：
文献类型：
--
作者：
Shukla, Nisha;Gellman, Andrew J.
手性表面是制备对映体纯药物的基础材料。本展望讨论了手性表面制造的最新进展，以及可扩展、高表面积、对映体纯表面的进展。手性表面是对映选择性非均相过程的关键组成部分，例如用于制备对映纯药物的过程。虽然实际应用中的大多数手性表面都是基于表面被纯手性吸附剂修饰的非手性材料，但有许多具有有价值的表面特性的无机材料，如果它们的表面本质上是手性的，则可以呈现对映特异性。本展望讨论了具有对映体特异性吸附、表面化学和电子发射的固有手性表面的制备的最新进展。我们提出了可扩展制造高表面积、对映体纯表面的可能途径，并讨论了未来进展的机会。
Chiral surfaces are fundamental materials for the preparation of enantiomerically pure pharmaceuticals. This Perspective discusses the recent advances in the fabrication of chiral surfaces and the progress towards scalable, high-surface-area, enantiomerically pure surfaces.Chiral surfaces are critical components of enantioselective heterogeneous processes such as those used to prepare enantiomerically pure pharmaceuticals. While the majority of chiral surfaces in practical use are based on achiral materials whose surfaces have been modified with enantiomerically pure chiral adsorbates, there are many inorganic materials with valuable surface properties that could be rendered enantiospecific, if their surfaces were intrinsically chiral. This Perspective discusses recent developments in the fabrication of intrinsically chiral surfaces exhibiting enantiospecific adsorption, surface chemistry and electron emission. We propose possible paths to the scalable fabrication of high-surface-area, enantiomerically pure surfaces and discuss opportunities for future progress.