Crack-healing and oxidation behavior of silicon nitride ceramics

Crack-healing and oxidation behavior of silicon nitride ceramics
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DOI:
10.1016/s0955-2219(03)00645-9
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发表时间:
2004-07-01
影响因子:
5.7
通讯作者:
Sato, S
Sato, S
中科院分区:
材料科学1区
文献类型:
--
作者:
Houjou, K;Ando, K;Sato, S

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Si3N4/SiC 复合陶瓷样品按照 JIS 标准制造,经过烧结并进行三点弯曲。在每个试件的拉伸侧均产生直径为50-400μm的半椭圆形表面裂纹。研究了作为环境、温度、时间和裂纹尺寸函数的裂纹愈合行为,以及作为温度和时间函数的氧化行为。主要结论如下:(1)裂纹在空气中完全愈合,但在Ar气、N-2气体和真空中均不愈合。 (2) 这种Si3N4陶瓷能够在900至1400℃的温度下完全治愈裂纹。 (3)能够完全愈合的最大表面裂纹尺寸为直径200μm。 (4)裂纹愈合和氧化的活化能分别为150和131KJ/mol。 (C) 2003 Elsevier Ltd. 保留所有权利。
Si3N4/SiC Composite ceramic specimens, made to JIS standard, were sintered and subjected to three-point bending. Semi-elliptical surface cracks of 50-400 mum in diameter were made on the tensile side of each specimen. Crack-healing behavior as a function of environment, temperature, time, and crack size, and oxidation behavior as a function of temperature and time were studied. The main conclusions are as follows: (1) Cracks healed completely in air, but did not heal in Ar gas, N-2 gas nor in a vacuum. (2) This Si3N4 ceramic has the ability to heal a crack at temperature from 900 to 1400 degreesC completely. (3) The maximum surface crack size that can be healed completely was 200 mum in diameter. (4) The activation energies for crack-healing and oxidation were 150 and 131KJ/mol, respectively. (C) 2003 Elsevier Ltd. All rights reserved.