Electrical and structural studies of plasma-polymerized fluorocarbon films
Electrical and structural studies of plasma-polymerized fluorocarbon films
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等离子体聚合氟碳薄膜的电学和结构研究
DOI：
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发表时间：
1990
期刊：
影响因子：
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通讯作者：
M. Moisan
中科院分区：
文献类型：
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作者：
N. Amyot;M. Wertheimer;Y. Segui;M. Moisan
研究了一系列具有不同组成和性能的等离子体聚合氟碳(PPFC)薄膜材料。红外和XPS光谱表明，富氟(类特氟龙)薄膜(F/C>；或约=1.7)的氧化程度相对较低。薄膜成分与其电学性能之间存在很强的相关性。报道了PPFC薄膜的TSD谱：在50℃和-80℃附近观察到的α和β弛豫分别与其他工作人员观察到的对应于羰基偶极子的介电弛豫和氟碳链段的局部运动有很好的相关性。电荷储存时间常数与F/C有较大的相关性，但数据散布较大，表明这种关系应作为进一步研究的对象。
A series of PPFC (plasma-polymerized fluorocarbon) film materials having widely varying compositions and properties was studied. Fluorine-rich (Teflon-like) films (F/C>or approximately=1.7) were found to have relatively low degrees of oxidation, as manifested by their infrared and XPS spectra. Strong correlations between film compositions and their electrical properties were found. The TSD spectra of PPFC films are reported: the alpha and beta relaxations observed near 50 degrees C and -80 degrees C, respectively, correlate well with dielectric relaxations corresponding to carbonyl dipoles and to local motions of fluorocarbon chain segments observed by other workers. The charge storage time constants shows rough correlation with F/C; the large scatter of data, however, suggests that this relationship should be the object of further studies.<<ETX>>