Structure and tribological behavior of Pb-Ti/MoS2 nanoscaled multilayer films deposited by magnetron sputtering method
Structure and tribological behavior of Pb-Ti/MoS2 nanoscaled multilayer films deposited by magnetron sputtering method
复制标题
磁控溅射法沉积Pb-Ti/MoS2纳米多层薄膜的结构和摩擦学行为
DOI：
10.1016/j.apsusc.2017.10.170
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发表时间：
2018
影响因子：
6.7
通讯作者：
Wang L.
中科院分区：
文献类型：
--
作者：
Li H.;Xie M.;Zhang G.;Fan X.;Li X.;Zhu M.;Wang L.
采用非平衡磁控溅射方法制备了不同双层周期的PbTiMoS2纳米多层膜。对薄膜的形貌、微观结构、力学性能和摩擦学性能进行了研究。结果表明，由于扩散效应，当双层周期从25 nm减小到6 nm时，薄膜由多层结构向复合结构转变。多层膜有明显的(002)衍射峰，界面以下的MoS2晶片的生长受铅和钛的影响，MoS2晶片的c轴以−30°~30°的角度向衬底倾斜。根据双层周期的不同，薄膜的硬度从5.9到7.2 Gpa不等。薄膜的摩擦学行为是在真空下进行的，摩擦系数通常在0.25以下。此外，双层周期为20 nm的纳米多层膜表现出比纯MoS_2更好的力学和摩擦学性能。结果表明，纳米多层膜是开发高基面取向真空固体润滑MoS2基材料的一种设计方法。
The Pb-Ti/MoS2nanoscaled multilayer films with different bilayer period were deposited by unbalanced magnetron sputtering system. The morphology, microstructure, mechanical and tribological properties of the films were investigated. It was found that the film changed from multilayer structure to composite structure as the bilayer period decreased from 25 nm to 6 nm, due to the diffusion effect. The multilayer film showed a pronounced (002) diffraction peak, the growth of the MoS2platelets below the interface were affected by Pb and Ti, and the c-axis of MoS2platelets were inclined to the substrate at an angle of −30° to 30°. The hardness of the film ranged from 5.9 to 7.2 GPa depending on the bilayer period. The tribological behavior of the films was performed under vacuum, and the friction coefficient were typically below 0.25. Furthermore, the nanoscale multilayer film with a bilayer period of 20 nm exhibits much better mechanical and tribological properties than pure MoS2. The result indicates that the nanoscale multilayer is a design methodology for developing high basal plane oriented and vacuum solid lubricating MoS2based materials.