ALS-U: A Soft X-Ray Diffraction Limited Light Source
ALS-U: A Soft X-Ray Diffraction Limited Light Source
复制标题
ALS-U：软 X 射线衍射受限光源
DOI：
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发表时间：
2016
期刊：
影响因子：
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通讯作者：
Yuchen Yang
中科院分区：
文献类型：
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作者：
C. Steier;A. Anders;J. Byrd;K. Chow;R. Duarte;Jin;T. Luo;H. Nishimura;T. Oliver;J. Osborn;H. Padmore;C. Pappas;S. Persichelli;D. Robin;F. Sannibale;S. Santis;R. Schlueter;Changchun Sun;C. Swenson;M. Venturini;W. Waldron;E. Wallén;W. Wan;Yuchen Yang
使用多个弯曲消色差光栅设计，亮度和相干通量可以提高约两个数量级[1]。这些改进可以作为现有设施的升级来实施，如高级光源升级（ALS-U）的情况。ALS-U将重复使用大部分现有的基础设施，从而减少达到全面科学生产力所需的成本和时间。本文总结了加速器的设计进展以及正在进行的R+D计划的一些细节。
Improvements in brightness and coherent flux of about two orders of magnitude are possible using multi bend achromat lattice designs [1]. These improvements can be implemented as upgrades of existing facilities as in the case of the Advanced Light Source Upgrade (ALS-U). ALS-U will reuse much of the existing infrastructure, thereby reducing cost and time needed to reach full scientific productivity. This paper summarizes the accelerator design progress as well as some details of the ongoing R+D program.