A feasible method for the fabrication of VAlTiCrSi amorphous high entropy alloy film with outstanding anti-corrosion property
A feasible method for the fabrication of VAlTiCrSi amorphous high entropy alloy film with outstanding anti-corrosion property
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一种制备具有优异耐腐蚀性能的VAlTiCrSi非晶高熵合金薄膜的可行方法
DOI：
10.1016/j.apsusc.2019.03.338
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发表时间：
2019-07
影响因子：
6.7
通讯作者：
Wang Liping
中科院分区：
文献类型：
--
作者：
Zheng Shujing;Cai Zhaobing;Pu Jibin;Zeng Chun;Chen Shengyu;Chen Ran;Wang Liping
采用直流磁控溅射方法成功地制备了在人工海水中具有优良耐蚀性的VAlTiCrSi高熵合金(HEA)薄膜。靶材由高纯度(~gt；99.9%)V、Al、Ti、Cr、Si棒材周期性阵列拼接而成。X射线衍射和透射电子显微镜分析结果表明，HEA薄膜具有均匀的非晶相结构，有利于提高衬底的阻挡性能。在人工海水中，HEA膜的腐蚀电流密度为4.68 × 10~(-9) A/cm~2，比304膜的腐蚀电流密度(5.44 × 10~(-8) A/cm~2)低一个数量级，腐蚀表面有明显的点蚀孔洞，而HEA膜则没有，说明VAlTiCrSiHEA膜的耐蚀性能优于304膜，这是由于HEA膜中的组成元素具有较强的耐蚀能力，在动电位极化测试中诱导形成致密的钝化膜。
The VAlTiCrSi high-entropy alloy (HEA) film with excellent corrosion-resistance in artificial sea water was successfully and easily fabricated by DC magnetron sputtering. The target is spliced by high purity (>99.9%) V, Al, Ti, Cr and Si bars with periodic array. Based on the XRD and TEM results, it can be found that the HEA film shows a homogeneous microstructure of with amorphous phase, which is beneficial to enhance the barrier performance of substrate. In artificial seawater, the corrosion current density of HEA film reaches 4.68 × 10–9 A/cm2, an order of magnitude lower than that of 304 substrate (5.44 × 10–8 A/cm2), and the pitting pores are clearly seen on the corrode surface of 304 substrate, but not on HEA film, showing that the corrosion-resistance of VAlTiCrSi HEA film is superior to that of 304 substrate, which is attributed to the constituent elements in HEA film with strong anti-corrosion ability to induce the formation of dense passivation film during the potentiodynamic polarization tests.
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