Tungsten-Surface-Structure Dependence of Sputtering Yield for a Noble Gas
Tungsten-Surface-Structure Dependence of Sputtering Yield for a Noble Gas
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DOI：
10.1585/pfr.11.2401080
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发表时间：
2016-06
影响因子：
0.8
通讯作者：
H. Nakamura;S. Saito;A. Ito;A. Takayama
中科院分区：
文献类型：
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作者：
H. Nakamura;S. Saito;A. Ito;A. Takayama
利用任意结构目标程序AC∀T中原子碰撞的二元碰撞近似模拟，计算了Ar原子辐照下粗糙表面钨的溅射产额、射程和保持率。模拟结果表明，溅射产额随表面粗糙度的增加而降低，保留率随表面粗糙度增加而增大。由于这些量强烈地依赖于表面，我们建议在估计墙的影响时，有必要考虑钨靶的表面结构。
Using the binary-collision approximation simulation with atomic collision in any structured target code AC∀T, we calculated sputtering yield, range, and retention rate for tungsten with a rough surface under argon atom irradiation. The simulation revealed the sputtering yield decreases and the retention rate increases as the surface becomes rougher. Because these quantities strongly depend on the surface, we suggest that it is necessary to consider the surface structure of the tungsten target when estimating the effects of walls.