Novel extreme ultraviolet (EUV)-resist material based on noria (water wheel-like cyclic oligomer)

Novel extreme ultraviolet (EUV)-resist material based on noria (water wheel-like cyclic oligomer)
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DOI:
10.1039/b925403j
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发表时间:
2010-01-01
影响因子:
--
通讯作者:
Nishikubo, Tadatomi
Nishikubo, Tadatomi
中科院分区:
其他
文献类型:
--
作者:
Kudo, Hiroto;Suyama, Yuji;Nishikubo, Tadatomi

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研究了含金刚烷酸酯侧基的诺丽亚衍生物(noria-ADs)的合成和性质,以评估其作为抗极紫外(EUV)材料的适用性。通过调节反应物的投料比和反应温度,合成了不同AD引入度的Noria-AD。它们的物理性质(溶解性、热稳定性和成膜能力)的差异与DI值的差异一致。在EUV抗蚀剂系统中研究了noria-AD(23)(DI = 23)和noria-AD(44)(DI = 44)的图案化特性,并且noria-AD(23)比noria-AD(44)产生更高的分辨率,提供清晰的线和空间图案,其分辨率为26 nm,线边缘粗糙度(LER)为8.3 nm。
The synthesis and properties of noria derivatives (noria-ADs) with pendant adamantate (AD) groups were examined to assess the suitability of these compounds for application as extreme ultraviolet (EUV)-resist materials. Noria-ADs with various degrees of introduction (DI) of AD were synthesized by adjusting the reactant feed ratio and reaction temperature. The differences in their physical properties (solubility, thermal stability, and film-forming ability) were consistent with the differences in DI values. The patterning properties of noria-AD(23) (DI = 23) and noria-AD(44) (DI = 44) were investigated in an EUV-resist system, and noria-AD(23) yielded higher resolution than noria-AD(44), providing a clear line and space pattern with a resolution of 26 nm and a line-edge roughness (LER) of 8.3 nm.