Interaction of oxygen with (Er + Si): formation of erbium pyrosilicate Er2Si2O7
Interaction of oxygen with (Er + Si): formation of erbium pyrosilicate Er2Si2O7
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氧与 (Er Si) 相互作用：形成焦硅酸铒 Er2Si2O7
DOI：
10.1016/s0169-4332(96)00560-0
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发表时间：
1997
期刊：
影响因子：
--
通讯作者：
M. Brunel
中科院分区：
文献类型：
--
作者：
K. Hafidi;Y. Ijdiyaou;M. Azizan;E. L. Ameziane;A. Outzourhit;T. Tan;M. Brunel
在不破坏真空度的情况下，采用反应射频溅射法在硅衬底上依次沉积了SiOx/Erox/SiOx/Si结构的氧化硅(SiOx)和氧化铒(Erox)薄膜。随后，在10−3mbar的Ar压力下，在800℃下对结构进行热处理。XPS测试表明，所得到的薄膜是均匀的。Si2p，Er4d和O1s芯能级峰的相对强度表明Er：Si：O的组成比为2：2：7。此外，观察到的Si2p和Er4d峰的化学位移表明，在四面体和八面体氧环境中形成了硅(Si)和铒(Er)的化合物。X射线衍射仪的测量结果表明，样品中生成了焦硅酸铒(Er2Si2O7)，这与XPS的结果一致。
Silicon oxide (SiOx) and erbium oxide (ErOx) layers in the form of SiOx/ErOx/SiOx/Si structures were sequentially deposited onto silicon substrates by reactive RF-sputtering without breaking the vacuum. The structures were subsequently heat treated at 800°C under an argon pressure of 10−3mbar. XPS measurements revealed that the layers thus obtained are homogeneous. The relative intensities of the Si 2p, Er 4d and O 1s core level peaks suggest a Er:Si:O composition ratio equal to 2:2:7. Furthermore, the chemical shifts observed for the Si 2p and Er 4d peaks showed the formation of a compound in which silicon (Si) and erbium (Er) are, respectively, in tetrahedral and octahedral oxygen environments. XRD measurements showed the formation of erbium pyrosilicate (Er2Si2O7) which is consistent with the XPS results.