PREVALENCE AND METHODS OF CONTROL OF CEPHALIC SKIN POTENTIAL EEG ARTIFACT
PREVALENCE AND METHODS OF CONTROL OF CEPHALIC SKIN POTENTIAL EEG ARTIFACT
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DOI:
10.1111/j.1469-8986.1974.tb00554.x
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发表时间:
1974-01-01
期刊:
影响因子:
3.7
通讯作者:
KOPELL, BS
中科院分区:
文献类型:
--
作者:
CORBY, JC;ROTH, WT;KOPELL, BS
Prevalence of the cephalic skin potential (CSP) artifact was studied in 21Ss during EEG recording of the Contingent Negative Variation (CNV), averaged evoked response (AER), and verbal free association test. Skin potential response and electro‐oculogram (EOG) were also recorded. Subdermal pin electrodes and local anesthesia infusion were employed to eliminate the CSP artifact in the EEG.Results indicated that EEG recorded from subdermal pin electrodes or from locally anesthetized scalp was free of CSP artifact. The EEG recorded from subdermal pin electrodes demonstrated spontaneous potential shifts but appeared adequate for EEG recording of the CNV or the AER.Significant CSP artifact was demonstrated in the EEG of 10 of 21Ss, both evoked by stimuli (10Ss) and spontaneous (3Ss). CSP artifact significantly increased CNV amplitude. CSP artifact significantly increased the AER late positive wave (P3) to infrequent tones.Studies of CNV and AER can be confounded by CSP artifact. Above techniques appear promising for recording EEG free of CSP artifact.