Gas Cluster Ion Beams for Processing New Materials
Gas Cluster Ion Beams for Processing New Materials
复制标题
用于加工新材料的气体团簇离子束
DOI：
10.1142/9789812816696_0003
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发表时间：
1998
期刊：
影响因子：
--
通讯作者：
I. Yamada
中科院分区：
文献类型：
--
作者：
I. Yamada
本文对气体团簇离子束的辐照效应进行了实验研究和理论模拟。结果表明，团簇离子-表面相互作用为表面处理提供了新的机会，如极浅注入（小于0.1mm）、极高速溅射（比单体离子高两个数量级）、横向溅射效应、光滑表面形成（平均表面粗糙度小于1 nm）、低衬底温度下的薄表面层形成等。
Irradiation effects of gas cluster ion beams have been studied experimentally and simulated theoretically for various combinations of ion species, energies and materials. It is shown that cluster ion - surface interactions offer new opportunities for surface processing such as very shallow implantation (less than 0.1 mm in Si), very high rate sputtering (two orders of magnitude higher than for monomer ions), lateral sputtering effects, smooth surface formation (average surface roughness less than 1 nm), thin surface layer formation at low substrate temperature etc.