Fabrication of self-supporting antireflection-structured film by UV-NIL
Fabrication of self-supporting antireflection-structured film by UV-NIL
复制标题
DOI：
10.1016/j.mee.2013.03.041
复制
发表时间：
2013-10-01
影响因子：
2.3
通讯作者：
Taniguchi, Jun
中科院分区：
文献类型：
--
作者：
Abu Talip, Nurhafizah Binti;Taniguchi, Jun
紫外纳米压印光刻（UV-NIL）是制造具有抗反射（AR）结构的薄膜（AR薄膜）的有力工具，广泛应用于平板显示器、手机显示屏、太阳能电池表面、光学镜头等。为了制造 AR 薄膜，将制造的 AR 结构复制到透明聚对苯二甲酸乙二醇酯 (PET) 薄膜顶部的 UV 光固化聚合物（树脂）上。然而，AR结构聚合物和PET薄膜之间的界面导致高界面反射。因此，需要一种能够消除界面反射的自支撑AR聚合物薄膜。在我们前期的研究中，采用聚乙烯醇（PVA）薄膜作为中间膜来获得自支撑聚合物薄膜，但这种自支撑薄膜的耐久性很低。在本研究中，我们使用聚丙烯（PP）薄膜代替PVA薄膜作为中间薄膜，这使自支撑AR聚合物薄膜具有更高的稳定性。还评价了自支撑膜的剥离力和粘合力。所制备的自支撑AR结构薄膜在430-950 nm光谱范围内表现出0.2-0.3%的反射率。 (C) 2013 Elsevier B.V. 保留所有权利。
Ultraviolet nanoimprint lithography (UV-NIL) is a powerful tool for the fabrication of films with antireflection (AR) structures (AR films), which are widely used in flat panel displays, mobile phone displays, solar cell surfaces, optical lenses, and so on. To fabricate the AR films, fabricated AR structures are replicated onto a UV photocurable polymer (resin) on top of a transparent poly (ethylene terepthalate) (PET) film. However, the interface between the AR structured polymer and the PET film causes high interface reflection. Therefore, a self-supporting AR polymer film that can eliminate interface reflection is required. In our previous research, polyvinyl alcohol (PVA).film was used as the intermediate film to obtain a self-supporting polymer film, but the durability of this self-supporting film was very low. In this study, instead of PVA film, we used polypropylene (PP) film as the intermediate film, which gives more stability to the self-supporting AR polymer film. The release and adhesive force of the self-supporting film were also evaluated. The fabricated self-supporting AR structure film exhibited 0.2-0.3% reflectivity in the spectrum range 430-950 nm. (C) 2013 Elsevier B.V. All rights reserved.