Effect of developer molecular size on roughness of dissolution front in electron-beam resist
Effect of developer molecular size on roughness of dissolution front in electron-beam resist
复制标题
显影剂分子尺寸对电子束抗蚀剂溶解前沿粗糙度的影响
DOI：
10.1116/1.1736647
复制
发表时间：
2004
影响因子：
1.4
通讯作者：
H. Namatsu
中科院分区：
文献类型：
--
作者：
T. Yamaguchi;H. Namatsu
本文描述了电子束正色抗蚀剂溶解前沿粗糙度的产生。从溶剂分子大小的角度研究了显影剂溶剂分子对表面粗糙度和溶解速率的影响。溶出速度与溶剂分子大小的关系由两条斜率不同的直线表示，这两条直线对应于一系列烷基乙酸酯溶剂。在乙酸乙酯和乙酸丙酯之间存在一个对应于临界分子尺寸的弯曲点。这表明，大于或小于临界分子尺寸的醋酸酯之间的溶解行为有很大不同。溶剂分子的大小是决定表面粗糙度的主要因素。对于大于临界分子尺寸的溶剂分子，由于聚合物聚集体出现在溶解前沿，因此粗糙度变大。另一方面，对于较小的溶剂分子。
This article describes the generation of roughness at the dissolution front of electron-beam positive-tone resist. The effect of a developer solvent molecule on the surface roughness as well as on the dissolution rate is investigated from the viewpoint of the size of a solvent molecule. The relationship between the dissolution rate and solvent molecular size is represented by two straight lines with different slopes in a homologous series of alkyl acetate solvents. A bending point, which corresponds to a critical molecular size, exists between ethyl and propyl acetate. This indicates that the dissolution behavior is largely different between acetates that are larger or smaller than the critical molecular size. The size of a solvent molecule is the dominant factor determining the degree of surface roughness. For a solvent molecule larger than the critical molecular size, the roughness becomes large because polymer aggregates appear on the dissolution front. For a smaller solvent molecule, on the other hand...