Effects of plasma exposure on structural and optical properties of TiO2 films deposited by off-axis target sputtering
Effects of plasma exposure on structural and optical properties of TiO2 films deposited by off-axis target sputtering
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等离子体暴露对离轴靶溅射沉积 TiO2 薄膜结构和光学性能的影响
DOI：
10.1116/1.1510530
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发表时间：
2002
期刊：
影响因子：
--
通讯作者：
W. Mizuno
中科院分区：
文献类型：
--
作者：
T. Takahashi;H. Nakabayashi;W. Mizuno
在Ar和O2混合气氛下，采用离轴靶溅射方法，在玻璃载玻片衬底上反应沉积了厚度约为800 ~ 2300 nm的TiO2薄膜。膜的最大沉积速率为12.8 nm/min。利用分光光度法、拉曼光谱法和x射线衍射法分别测定了薄膜的光学性能和晶体结构。本研究中沉积的薄膜大部分是透明的，具有锐钛矿晶体结构，也有一部分是半透明的。在x射线衍射图中观察到A（101）、A（112）、A（211）和A（220）峰，其中A为TiO2的锐钛矿相。随着等离子体暴露的增加，A（101）和A（112）的x射线峰强度IP逐渐降低，而A（211）和A（220）的x射线峰强度IP逐渐增加。在本研究中，IP很大程度上取决于底物的位置。随着TiO2晶型的增大，A（220）峰明显高于其他峰。死亡……
TiO2 films with thickness of about 800–2300 nm have been reactively deposited on glass-slide substrates at an atmosphere of Ar and O2 mixture, using the off-axis target sputtering method. The maximum deposition rate of the film was 12.8 nm/min. The optical properties and the crystal structure of the films were measured using spectrophotometry, Raman spectroscopy, and x-ray diffractometry, respectively. Most of the films deposited in this study were transparent and had anatase crystal structure, while some of them were semitransparent. The A(101), A(112), A(211) and A(220) peaks were observed in the x-ray diffraction patterns, where A shows the anatase phase of TiO2. With increasing plasma exposure, the x-ray peak intensities IP of A(101) and A(112) gradually decreased, while the IP of A(211) and A(220) gradually increased. The IP depended strongly on the substrate position in this study. Moreover, the A(220) peak was significantly higher than other peaks when the TiO2 crystallites became larger. The anata...